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Lett 1997, 33:1255.CrossRef Competing interests The authors declare that they have no competing interests. Authors’ contributions H-YL conceived the study and participated in its design and coordination. H-LH and C-YT carried out the experiments. H-YL, H-LH, and C-YT drafted the manuscript. All authors read and

approved the final manuscript.”
“Background Nanostructures of silicon have been widely used in micro/nanoelectromechanical systems (MEMS/NEMS) [1], photovoltaic devices [2–4], nanoimprint lithography template [5], and so on. As a typical nanofabrication method on silicon, photolithography technique involves complex systems and multiple steps [6, 7]. Although it has a huge merit in mass production, photolithography is not suitable for flexible fabrication of micro-mold and prototype fabrication of microsystems [8]. Therefore, it remains essential to develop a simple and flexible nanofabrication technique to meet the requirements Endonuclease of nanoscience and nanotechnology. Due to its simplicity, flexibility, and high resolution, scanning probe microscope (SPM)-based techniques have been demonstrated to hold great potential in fabricating nanostructures [9–14]. Among various SPM-based techniques of silicon, local anodic oxidation [13] and friction-induced selective etching [14] have attracted much attention from researchers. However, local anodic oxidation process strongly relies on the experimental parameters such as voltage, humidity, tip dwell time, and gaseous ambient environment [15].